JPH03110752U - - Google Patents
Info
- Publication number
- JPH03110752U JPH03110752U JP2055890U JP2055890U JPH03110752U JP H03110752 U JPH03110752 U JP H03110752U JP 2055890 U JP2055890 U JP 2055890U JP 2055890 U JP2055890 U JP 2055890U JP H03110752 U JPH03110752 U JP H03110752U
- Authority
- JP
- Japan
- Prior art keywords
- sputtering target
- sputtering
- vacuum chamber
- ion source
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005477 sputtering target Methods 0.000 claims 5
- 150000002500 ions Chemical class 0.000 claims 4
- 238000004544 sputter deposition Methods 0.000 claims 2
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2055890U JPH03110752U (en]) | 1990-02-28 | 1990-02-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2055890U JPH03110752U (en]) | 1990-02-28 | 1990-02-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03110752U true JPH03110752U (en]) | 1991-11-13 |
Family
ID=31523646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2055890U Pending JPH03110752U (en]) | 1990-02-28 | 1990-02-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03110752U (en]) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0195454A (ja) * | 1987-10-07 | 1989-04-13 | Oki Electric Ind Co Ltd | 高ドーズイオン注入装置 |
| JPH01267935A (ja) * | 1988-04-19 | 1989-10-25 | Denki Kagaku Kogyo Kk | シリコンイオンビーム発生方法 |
-
1990
- 1990-02-28 JP JP2055890U patent/JPH03110752U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0195454A (ja) * | 1987-10-07 | 1989-04-13 | Oki Electric Ind Co Ltd | 高ドーズイオン注入装置 |
| JPH01267935A (ja) * | 1988-04-19 | 1989-10-25 | Denki Kagaku Kogyo Kk | シリコンイオンビーム発生方法 |
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